all-solution processed polymer light-emitting diode displays

by:LCD Mall     2020-08-06
The adoption of emerging technologies for printing electronics in the manufacture of new ultra-thin flat panel displays has attracted interest in academia and industry due to the physical challenges of devices and the potential to reduce production costs.
We produce here.
Polymer Light treated by solution
LEDs displayed by solution
The cathode is deposited and the multi-functional buffer layer between the cathode and the organic layer is utilized. The use of ink-
High yield of jet conductive nanoparticles as cathode
There is no resolution cathode pattern of any mechanical stress on the organic layer.
Buffer layer providing solvent function-
Anti-electronic injection and proper affinity were prepared by mixing water/alcohol together
Soluble Polymer and curing epoxy adhesive. Our 1. 5-
Inch polymer lamp
The LEDs display is made without any dead pixels or dead lines. The all-
The solution process eliminates the high vacuum demand for cathode thermal evaporation, paving the way for industrial rollingto-
Roller Manufacturing of flat panel display.
Unless otherwise stated, all chemicals and materials are purchased and used in accordance with the requirements received. PEDOT:PSS (
Clevios P Al4083)
From H. C.
Poly stark Limited-vinylcarbazole)
Purchased from Aldrich and MEH. PPV and P-
Pv was purchased from Guangdong aldejin Optoelectronic Materials Co. , Ltd. , Ltd.
Other materials were synthesized in our lab.
Determine film thickness using a profile meter (
Veeco Deco 150).
Surface resistance measurement using four-
Point detection station (KDY-
1 in Guangzhou Kunde Technology Co. , Ltd. , Ltd. ).
Perform SEM on Hitachi S-
3700 SEM runs under 15 kV at Hitachi H-
The 7650 TEM operates under 80kv.
These properties were measured using the Keithley 236 light source
The meter unit and the calibrated photoelectric diode.
PR-calibration brightness using photo studies
705 SpectraScan metering.
PFNR and epoxy adhesive (ELC 2500CL)
Dissolved into methanol at concentrations of 10 ml and 100mg mgml, respectively.
Several drops of acetic acid were added to the PFNR solution to improve the solubility.
Mix the solution of PFNR and epoxy resin with the calculated volume ratio to form the MSDS combined with the desired weight ratio.
ITO substrate (
China Southern Glass Holdings)
Ultrasonic cleaning was carried out in sequence with acetone, detergent, deionized water and acetone.
After UV ozone plasma treatment, the substrate is rotatedcoated with 50-
Nm thick PEDOT: PSS, then annealing for 10 minutes in nitrogen at 200 °c.
Fill the glove box (
Vacuum atmosphere company). Next, 80u2009nm P-
In the spin-
The coating is at the top of the PEDOT: PSS layer, followed by the BL spin-coating.
Curing in UV curing chamber (
ELC500 from TiVo-Lite Corp.
Output 30 mW cuccm)
2 minutes, then annealing at 65 °c for 30 minutes.
Preparation of cathode ink, 2 ml nano silver ink (DGP 40LT-15C)
Filtered through a 0. 45-
The Hydrophobic drain filter is loaded into the ink cartridge of the inkjet printer (DMP 2831). Then, 1. 9-
A rectangular ink pattern of mm width is printed on the device with nozzle height of 1mm and drop spacing of 25 μm.
Effective LightLaunch Area (1. 9 × 7. 5u2009mm)
Defined by the overlap of ITO anode and silver nanoparticles cathode.
After printing, bake the equipment at 80 °c in nitrogen
Filling glove box for removal of ink solvent.
In order to improve the conductivity of the cathode, we re-
Print the same pattern on a dry silver nanoparticles film.
Typical thickness of double-
The printed cathode is about 1 μm.
After printing and drying, bake at 14 °c for 30 minutes to sintering silver nanoparticles and make the cathode have conductivity.
Equipment listed in production on P-
We performed the following steps. Device A (ITO/PEDOT/P-PPV/Ba/Al): a 4-
Layer 200-nm ba
As a cathode, the nm aluminum layer is evaporated by heat. Device B (ITO/PEDOT/P-PPV/PFNR/Al): a 20-
Spin-nm PFNR layer
Coating and 200-
As a cathode, the nm aluminum layer is evaporated by heat. Device C (ITO/PEDOT/P-PPV/PFNR/Ag): a 20-
Spin-nm PFNR layer
Coating and 200-
As a cathode, the nm silver layer is evaporated by heat. Device D (ITO/PEDOT/P-
PPV/PFNR/nano Ag (ink-jetted)): a 20-
Spin-nm PFNR layer
Coating and ink-
As mentioned above, the sprayed silver nanoparticles cathode is patterned and solidified. Device E (ITO/PEDOT/P-PPV/BL/nano Ag (ink-jetted)): a 50-nm BL was spin-
Coating and ink-
As mentioned above, the sprayed silver nanoparticles cathode is patterned and solidified.
After optimizing the device structure and manufacturing process, all experiments were carried out at least three times.
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